Title :
Characteristics of ion-plasma coatings AlN-TiB2(TiSi2) after annealing
Author :
Demianenko, A.A. ; Sobol, O.V. ; Erdybaeva, N.K.
Author_Institution :
Sumy State Univ., Sumy, Ukraine
Abstract :
The magnetron sputtered coatings on base of AlN-TiB2(TiSi2) are investigated in this paper. The element composition, structural-phase composition, morphology are investigated after annealing of coatings with 900°C and 1300°C. The amorphous structure and high damping properties of the AlN-TiB2(TiSi2) coating make promising the use of these coatings as diffusion barriers in the form of independent elements.
Keywords :
III-V semiconductors; aluminium compounds; amorphous state; annealing; damping; plasma deposited coatings; plasma deposition; sputtered coatings; titanium compounds; wide band gap semiconductors; AlN-TiB2(TiSi2); amorphous structure; annealing; damping properties; diffusion barriers; element composition; ion-plasma coating characteristics; magnetron sputtered coatings; structural-phase composition; temperature 1300 degC; temperature 900 degC; Annealing; Silicon;
Conference_Titel :
Microwave & Telecommunication Technology (CriMiCo), 2014 24th International Crimean Conference
Conference_Location :
Sevastopol
Print_ISBN :
978-966-335-412-5
DOI :
10.1109/CRMICO.2014.6959623
