DocumentCode :
1564326
Title :
A Pattern Recognition Tool for Automatic Etch Process Quality Check
Author :
Russo, Stefano ; Russo, Felice
Author_Institution :
Micron, Avezzano
fYear :
2008
Firstpage :
65
Lastpage :
68
Abstract :
This paper presents an automatic tool for image analysis applied to semiconductor in-line inspections. The goal of this tool is to understand automatically which contacts in the wafer have been not completely etched during the plasma process and an etch step. For this reason we developed an algorithm able to classify the observed structures in scanning electron microscope (SEM) inspections. Such recognition provides a quick and detailed analysis of the under-etched contacts, which is based on fixed rules and thus objective. Automation controls, applied to the tool results, allow for complete monitoring of etch chambers and of the SEM images quality as well. Applying this tool should result in cost saving and yield increase.
Keywords :
etching; inspection; pattern recognition; process monitoring; quality control; scanning electron microscopy; semiconductor device manufacture; automatic etch; image analysis; monitoring; pattern recognition; quality check; scanning electron microscope; semiconductor inline inspections; Automatic control; Automation; Computerized monitoring; Etching; Image analysis; Image quality; Inspection; Pattern recognition; Plasma applications; Scanning electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
ISSN :
1078-8743
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2008.4529010
Filename :
4529010
Link To Document :
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