DocumentCode
1564558
Title
Control of RF Match Presets: Common Source of Variation
Author
Daigle, Cindy
Author_Institution
Nat. Semicond., South Portland, ME
fYear
2008
Firstpage
111
Lastpage
113
Abstract
While reviewing several scenarios of high reflected power, this paper discusses the importance of maintaining dry etch RF match tune and load recipe presets to minimize variation in critical process outputs and presents a systematic method to efficiently maintain presets using factory automation.
Keywords
factory automation; sputter etching; statistical process control; RF match presets; dry etch RF match tune; factory automation; load recipe presets; Etching; Hardware; Manufacturing automation; Plasma applications; Power engineering and energy; Process control; Production; RF signals; Radio frequency; Semiconductor device manufacture; RF; automation; efficiency; presets; process control; yield;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location
Cambridge, MA
ISSN
1078-8743
Print_ISBN
978-1-4244-1964-7
Electronic_ISBN
1078-8743
Type
conf
DOI
10.1109/ASMC.2008.4529034
Filename
4529034
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