DocumentCode :
1564709
Title :
Spatial Patterns in Sort Wafer Maps and Identifying Fab Tool Commonalities
Author :
Pierre, Eric R St ; Tuv, Eugene ; Borisov, Alexander
Author_Institution :
Intel Corp., Chandler, AZ
fYear :
2008
Firstpage :
268
Lastpage :
272
Abstract :
Methodologies for detecting non random spatial patterns on Sort bin wafer maps and discovering their fab tool commonalities are presented. The challenges encountered in implementing modern statistical learning algorithms for this task are discussed as well as their advantages over traditional methods. The methods are then demonstrated on production data.
Keywords :
integrated circuit manufacture; production engineering computing; software tools; statistical analysis; fab tool commonalities; sort wafer maps; spatial patterns; statistical learning algorithms; Analysis of variance; Clustering algorithms; Libraries; Production facilities; Software algorithms; Software tools; Space technology; Statistical analysis; Statistical learning; Supervised learning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
ISSN :
1078-8743
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2008.4529051
Filename :
4529051
Link To Document :
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