DocumentCode :
1564931
Title :
Industry Survey of Wafer Fab Reticle Control Quality Strategies
Author :
Dover, Russell
Author_Institution :
KLA-Tencor Corp., San Jose, CA
fYear :
2008
Firstpage :
372
Lastpage :
374
Abstract :
Reticle quality control in wafer fabs is different from quality control in mask shops. As such an industrywide survey was undertaken to benchmark different strategies and approaches taken. This paper summarizes the results while retaining the different wafer fabs´ anonymity and confidentiality. The approach taken for the survey was specifically designed to be impartial and independent of any tools, solutions or applications available from KLA-Tencor.
Keywords :
quality control; reticles; mask shop quality control; reticle quality control; wafer fab reticle; Contamination; Industrial control; Inspection; Lithography; Logic; Monitoring; Quality control; Random access memory; Research and development; Testing; Inspection; STARlight; crystal growth; lithography; mask defects; progressive defects; strategy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
ISSN :
1078-8743
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2008.4529073
Filename :
4529073
Link To Document :
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