Title :
Industry Survey of Wafer Fab Reticle Control Quality Strategies
Author_Institution :
KLA-Tencor Corp., San Jose, CA
Abstract :
Reticle quality control in wafer fabs is different from quality control in mask shops. As such an industrywide survey was undertaken to benchmark different strategies and approaches taken. This paper summarizes the results while retaining the different wafer fabs´ anonymity and confidentiality. The approach taken for the survey was specifically designed to be impartial and independent of any tools, solutions or applications available from KLA-Tencor.
Keywords :
quality control; reticles; mask shop quality control; reticle quality control; wafer fab reticle; Contamination; Industrial control; Inspection; Lithography; Logic; Monitoring; Quality control; Random access memory; Research and development; Testing; Inspection; STARlight; crystal growth; lithography; mask defects; progressive defects; strategy;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2008.4529073