• DocumentCode
    1569170
  • Title

    Magnetization evolution in microstructured Permalloy ellipses

  • Author

    Wu, J.C. ; Shieh, W.Z. ; Ching-Ray Chang ; Zung-Hang Wei ; Usov, N.A.

  • Author_Institution
    Dept. of Phys., Nat. Changhua Univ., Changua, Taiwan
  • fYear
    2002
  • Abstract
    Summary form only given. The advances in nanolithography and new techniques in probing magnetic domain structures such as magnetic force microscopy (MFM) have given scientists an unprecedented way towards the understanding of micromagnetism. We present results of magnetic domain configurations probed at remanent states as well as under external magnetic fields in microstructured Permalloy thin films. Special interest is focused on the formation and evolution of vortex states in elliptical elements. Various ellipses were delineated using standard electron beam lithography, followed by a thermal evaporation of permalloy in the absence of an external magnetic field. The patterned films were then transferred onto a SiN-coated Si-substrate through a lift-off process in acetone. A magnetic force microscope equipped with an external electromagnet was used to investigate the magnetization configurations.
  • Keywords
    Permalloy; ferromagnetic materials; magnetic domains; magnetic force microscopy; magnetic thin films; magnetisation; micromagnetics; remanence; Fe-Ni; MFM; Si; Si-SiN; acetone; electron beam lithography; elliptical elements; external magnetic field effects; lift-off process; magnetic domain structures; magnetic force microscopy; magnetization evolution; micromagnetism; microstructured Permalloy ellipses; microstructured Permalloy thin film; nanolithography; patterned films; remanent states; vortex states; Electromagnets; Electron beams; Lithography; Magnetic domains; Magnetic fields; Magnetic films; Magnetic force microscopy; Magnetic forces; Magnetization; Nanolithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
  • Conference_Location
    Amsterdam, The Netherlands
  • Print_ISBN
    0-7803-7365-0
  • Type

    conf

  • DOI
    10.1109/INTMAG.2002.1001103
  • Filename
    1001103