DocumentCode
1570442
Title
Corner compensation techniques in anisotropic etching of
Author
Sandmaier, H. ; Offereins, H.L. ; Kuhl, K. ; Lang, W.
Author_Institution
Fraunhofer Inst. fur Festkorpertechnol., Munchen, Germany
fYear
1991
Firstpage
456
Lastpage
459
Abstract
Various compensation structures preventing the undercutting of convex corners of
Keywords
compensation; electric sensing devices; elemental semiconductors; etching; micromechanical devices; silicon; KOH-H/sub 2/O solution; Si; anisotropic etching; compensation structures; corner compensation; elemental semiconductor; micromachining; orbiting V-grooves; rectangular solids; truncated pyramids; undercutting of convex corners; underetched geometries; Anisotropic magnetoresistance; Etching; Geometry; Mechanical systems; Micromachining; Micromechanical devices; Protection; Silicon; Solids; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-87942-585-7
Type
conf
DOI
10.1109/SENSOR.1991.148910
Filename
148910
Link To Document