DocumentCode
1570530
Title
Increased depth-of-field with numerically optimized general phase masks
Author
Fraue, Yann ; Castro, Albertina
Author_Institution
Inst. de Investig. en Mat. Aplic. y en Sist., Univ. Nac. Autonoma de Mexico, Mexico City
fYear
2008
Firstpage
364
Lastpage
365
Abstract
We propose a technique to optimize phase masks in order to increase the depth-of-field. The technique is based on cubic spline modeling of the phase and simulated annealing optimization.
Keywords
masks; optical elements; simulated annealing; splines (mathematics); cubic spline modeling; depth-of-field; numerically optimized general phase masks; simulated annealing optimization; Optical imaging; Optical modulation; Performance analysis; Phase modulation; Polynomials; Proposals; Shape control; Simulated annealing; Spline; Transfer functions;
fLanguage
English
Publisher
ieee
Conference_Titel
IEEE Lasers and Electro-Optics Society, 2008. LEOS 2008. 21st Annual Meeting of the
Conference_Location
Acapulco
Print_ISBN
978-1-4244-1931-9
Electronic_ISBN
978-1-4244-1932-6
Type
conf
DOI
10.1109/LEOS.2008.4688641
Filename
4688641
Link To Document