• DocumentCode
    1570530
  • Title

    Increased depth-of-field with numerically optimized general phase masks

  • Author

    Fraue, Yann ; Castro, Albertina

  • Author_Institution
    Inst. de Investig. en Mat. Aplic. y en Sist., Univ. Nac. Autonoma de Mexico, Mexico City
  • fYear
    2008
  • Firstpage
    364
  • Lastpage
    365
  • Abstract
    We propose a technique to optimize phase masks in order to increase the depth-of-field. The technique is based on cubic spline modeling of the phase and simulated annealing optimization.
  • Keywords
    masks; optical elements; simulated annealing; splines (mathematics); cubic spline modeling; depth-of-field; numerically optimized general phase masks; simulated annealing optimization; Optical imaging; Optical modulation; Performance analysis; Phase modulation; Polynomials; Proposals; Shape control; Simulated annealing; Spline; Transfer functions;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IEEE Lasers and Electro-Optics Society, 2008. LEOS 2008. 21st Annual Meeting of the
  • Conference_Location
    Acapulco
  • Print_ISBN
    978-1-4244-1931-9
  • Electronic_ISBN
    978-1-4244-1932-6
  • Type

    conf

  • DOI
    10.1109/LEOS.2008.4688641
  • Filename
    4688641