Title :
Large-area linear and nonlinear nanophotonics
Author_Institution :
Center for High Technol. Mater., Univ. of New Mexico, Albuquerque, NM
Abstract :
Interferometric lithography provides a facile technique for the fabrication of large-areas of nanophotonic structures. Examples of both linear and nonlinear responses will be drawn from plasmonics, metamaterials, and photonic crystals.
Keywords :
light interferometry; metamaterials; nanofabrication; nanolithography; nanophotonics; nonlinear optics; photolithography; photonic crystals; plasmonics; interferometric lithography; linear nanophotonic structures; metamaterials; nonlinear nanophotonics; photonic crystals; plasmonics; High speed optical techniques; Interferometric lithography; Metamaterials; Nanophotonics; Nonlinear optics; Optical harmonic generation; Optical interferometry; Optical ring resonators; Photonic crystals; Plasmons; metamaterials; nanophotonics; photonic crystal; plasmonics;
Conference_Titel :
IEEE Lasers and Electro-Optics Society, 2008. LEOS 2008. 21st Annual Meeting of the
Conference_Location :
Acapulco
Print_ISBN :
978-1-4244-1931-9
Electronic_ISBN :
978-1-4244-1932-6
DOI :
10.1109/LEOS.2008.4688791
