Title :
Laser deposition and etching of three-dimensional microstructures
Author :
Bloomstein, T.M. ; Ehrlich, D.J.
Author_Institution :
Lincoln Lab., MIT, Lexington, MA, USA
Abstract :
A patterning machine capable of 5*10/sup 4/ pixel per second random access scanning has been developed as a tool for laser microchemical fabrication of three-dimensional parts. The tool is designed to implement precision laser deposition and etching reactions through a direct interface to solid modeling CAD/CAM (computer-aided design and manufacturing) software. Initial results which the machine demonstrate clean etching of germanium and silicon with micrometer depth control and high speeds. High material selectivity has been exploited to write buried flow channels under oxide membranes. Processing of partially fabricated silicon parts, including those with damage-prone electronic devices already in place, should be possible.<>
Keywords :
chemical vapour deposition; etching; germanium; laser beam applications; laser beam machining; micromechanical devices; semiconductor technology; silicon; Ge; Si; buried flow channels; clean etching; direct interface; elemental semiconductor; high speeds; laser microchemical fabrication; micromechanics; micrometer depth control; oxide membranes; patterning machine; precision laser deposition; random access scanning; solid modeling CAD/CAM; three-dimensional microstructures; Computer aided manufacturing; Design automation; Etching; Laser modes; Microstructure; Optical design; Optical device fabrication; Silicon; Solid lasers; Solid modeling;
Conference_Titel :
Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-87942-585-7
DOI :
10.1109/SENSOR.1991.148924
