DocumentCode
1574781
Title
Optimization of the electron hole bilayer tunneling field effect transistor
Author
Agarwal, Sankalp ; Teherani, James T. ; Hoyt, Judy L. ; Antoniadis, Dimitri A. ; Yablonovitch, Eli
Author_Institution
Univ. of California, Berkeley, Berkeley, CA, USA
fYear
2013
Firstpage
109
Lastpage
110
Abstract
In order to reduce the power consumption of modern electronics, the operating voltage needs to be significantly reduced. The electron hole bilayer tunneling field effect transistor (bilayer TFET) has the potential for reduced voltage operation. [1, 2] The device structure is shown in Fig. 1. Recent simulations of the bilayer TFET show poor on-state current [1] and electrostatic gate efficiency [2]. In this work we propose a new biasing scheme to improve gate efficiency by exploiting quantum capacitance and create a new model to analyze the tradeoff between gate efficiency and on-state current to find the optimal device design.
Keywords
MOSFET; capacitance; optimisation; semiconductor device models; biasing scheme; electron hole bilayer tunneling field effect transistor; gate efficiency; on-state current; optimal device design; optimization; power consumption; quantum capacitance; voltage operation reduction; Conductivity; Integrated circuit modeling; Logic gates; Quantum capacitance; Silicon; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2013 71st Annual
Conference_Location
Notre Dame, IN
ISSN
1548-3770
Print_ISBN
978-1-4799-0811-0
Type
conf
DOI
10.1109/DRC.2013.6633817
Filename
6633817
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