• DocumentCode
    1574781
  • Title

    Optimization of the electron hole bilayer tunneling field effect transistor

  • Author

    Agarwal, Sankalp ; Teherani, James T. ; Hoyt, Judy L. ; Antoniadis, Dimitri A. ; Yablonovitch, Eli

  • Author_Institution
    Univ. of California, Berkeley, Berkeley, CA, USA
  • fYear
    2013
  • Firstpage
    109
  • Lastpage
    110
  • Abstract
    In order to reduce the power consumption of modern electronics, the operating voltage needs to be significantly reduced. The electron hole bilayer tunneling field effect transistor (bilayer TFET) has the potential for reduced voltage operation. [1, 2] The device structure is shown in Fig. 1. Recent simulations of the bilayer TFET show poor on-state current [1] and electrostatic gate efficiency [2]. In this work we propose a new biasing scheme to improve gate efficiency by exploiting quantum capacitance and create a new model to analyze the tradeoff between gate efficiency and on-state current to find the optimal device design.
  • Keywords
    MOSFET; capacitance; optimisation; semiconductor device models; biasing scheme; electron hole bilayer tunneling field effect transistor; gate efficiency; on-state current; optimal device design; optimization; power consumption; quantum capacitance; voltage operation reduction; Conductivity; Integrated circuit modeling; Logic gates; Quantum capacitance; Silicon; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2013 71st Annual
  • Conference_Location
    Notre Dame, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4799-0811-0
  • Type

    conf

  • DOI
    10.1109/DRC.2013.6633817
  • Filename
    6633817