DocumentCode :
1574982
Title :
Characterization of low frequency noise in nanowire FETs considering variability and quantum effects
Author :
Sang-Hyun Lee ; Ye-Ram Kim ; Jae-Ho Hong ; Eui-Young Jeong ; Jun-Woo Jang ; Jun-Sik Yoon ; Dong-Won Kim ; Chang-Ki Baek ; Jeong-Soo Lee ; Yoon-Ha Jeong
Author_Institution :
Dept. of Electr. Eng., POSTECH, Pohang, South Korea
fYear :
2013
Firstpage :
123
Lastpage :
124
Abstract :
Nanowire FETs (NWFETs) having gate-all-around (GAA) structure have been developed due to their novel short channel effect immunity and gate controllability [1]. However, the variability in electrical parameters including the drain current (Id) and transconductance (gm) has been observed in such ultra-scaled channel dimension down to 10 nm [2]. The diameter (dNW) of the channel region has also played an important role to manufacture large scale integrated circuit. At this point, this paper focuses on the variation in dc and noise parameters and characterizes the low frequency noise of the NWFETs considering the quantum effect.
Keywords :
field effect transistors; nanowires; semiconductor device noise; dc parameters; drain current; gate controllability; gate-all-around structure; large scale integrated circuit; low frequency noise; nanowire FET; noise parameters; quantum effects; short channel effect immunity; transconductance; ultra-scaled channel dimension; variability; Density measurement; Fluctuations; Frequency measurement; Low-frequency noise; Noise measurement; Scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2013 71st Annual
Conference_Location :
Notre Dame, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4799-0811-0
Type :
conf
DOI :
10.1109/DRC.2013.6633824
Filename :
6633824
Link To Document :
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