DocumentCode
1576100
Title
SrTiO3 /GdTiO3 heterostructure field effect transistors
Author
Shoron, O.F. ; Boucherit, M. ; Jackson, Crystal A. ; Moetakef, P. ; Stemmer, Susanne ; Rajan, Sreeraman
Author_Institution
Electr. & Comput. Eng. Dept., Ohio State Univ., Columbus, OH, USA
fYear
2013
Firstpage
205
Lastpage
206
Abstract
We report on the first high electron density SrTiO3/GdTiO3 (STO/GTO) heterostructure field effect transistors (HFETs). Recently, there has been great interest in high density 2DEGs formed at the interfaces between perovskite oxides [1]. In particular, the STO/GTO interface has been shown to have a sheet charge density of 3 × 1014 cm-2, equivalent to 0.5 e- per unit cell [2], due to the polar discontinuity at the interface (Fig. 2) [3], which is the highest achieved sheet charge density for any semiconductor 2D electron gas (2DEG). The high charge density and the high breakdown strength of these systems make them promising for electronics and plasmonics, as well as for new applications of correlated electron gas systems [4]. In this work, we show for the first time, current modulation in the STO/GTO system, with channel charge modulation of 6×1013 electrons/cm2, which is the highest reported value for any semiconductor material system.
Keywords
gadolinium compounds; high electron mobility transistors; space charge; strontium compounds; SrTiO3-GdTiO3; breakdown strength; channel charge modulation; current modulation; heterostructure field effect transistors; perovskite oxides; polar discontinuity; semiconductor 2D electron gas; semiconductor material system; sheet charge density; Capacitance; Electric breakdown; HEMTs; Logic gates; MODFETs; Materials; Modulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2013 71st Annual
Conference_Location
Notre Dame, IN
ISSN
1548-3770
Print_ISBN
978-1-4799-0811-0
Type
conf
DOI
10.1109/DRC.2013.6633865
Filename
6633865
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