Title :
Closed-form solution for cycle time of revisiting processes in single-arm cluster tool scheduling with atomic layer deposition
Author :
Sun, YuXi ; Wu, NaiQi ; Zhou, MengChu
Author_Institution :
Sch. of Mechatron. Eng., Guangdong Univ. of Technol., Guangzhou, China
Abstract :
Atomic layer deposition (ALD) is a typical process with wafer revisiting that should be performed by cluster tools. This paper discusses the scheduling problem of single-arm cluster tools for the ALD process. In scheduling such system, the most difficult part is to schedule the revisiting process and obtain its optimal cycle time. This paper studies the revisiting process of ALD with revisiting times k = 3, 4, and 5. Analytical expressions are obtained to calculate the cycle time for the k possible schedules with k = 3, 4, and 5, respectively, so as to obtain the optimal one. In this way, the scheduling problem of such a revisiting process becomes simple and this is a significant improvement in scheduling cluster tools with wafer revisiting.
Keywords :
atomic layer deposition; production control; atomic layer deposition; closed-form solution; optimal cycle time; scheduling cluster tool; single-arm cluster tool scheduling; wafer revisiting process; Color; Integrated circuit modeling; Load modeling; Robots; Schedules; Semiconductor device modeling; System recovery;
Conference_Titel :
Networking, Sensing and Control (ICNSC), 2011 IEEE International Conference on
Conference_Location :
Delft
Print_ISBN :
978-1-4244-9570-2
DOI :
10.1109/ICNSC.2011.5874923