Title :
Cross-tie walls in 25-45 nm-thick Permalloy films
Author :
Redjdal, M. ; Kakay, A. ; Ruane, M.F. ; Humphrey, F.B.
Author_Institution :
Dept. of Elctron. & Comput. Eng., Boston Univ., MA, USA
Abstract :
Summary form only given. Cross-tie walls in Permalloy films have been calculated as a function of thickness at 25, 35, 40 and 45 nanometers (nm) using direct integration of the Landau-Lifshitz-Gilbert equation in a Cartesian lattice with periodic boundary conditions along the length of the wall (y-direction). Previously, the Bloch-to-Neel wall transition was found around 35 nm in a study where the two-dimensional (2D) Neel and Bloch walls were considered separately. The present work is extended to a 3D transition, a Bloch-like transition along the wall (or Vertical Bloch Lines (VBLs)), between Neel walls of opposite chirality in a film with in-plane magnetization. This 3D transition is a cross-tie wall, a low energy state, which allows for the long tails of Neel walls to close magnetic flux in the vicinity of the walls.
Keywords :
Permalloy; ferromagnetic materials; magnetic domain walls; magnetic thin films; magnetic transitions; magnetisation; micromagnetics; 25 to 45 nm; 3D transition; Bloch wall; Fe-Ni; Landau-Lifshitz-Gilbert equation; Neel wall; Permalloy film; cross-tie wall; magnetic flux; magnetization; micromagnetic simulation; vertical Bloch line; Bridges; Equations; Lattices; Magnetic domain walls; Magnetic domains; Magnetic films; Magnetic flux; Magnetization; Physics; Solid state circuits;
Conference_Titel :
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
0-7803-7365-0
DOI :
10.1109/INTMAG.2002.1001459