Title :
Correlation of magnetoresistance with deposition parameters and annealing in CoFe/Cu multilayers
Author :
Ma, Y.Q. ; Cerezo, A. ; Georgalakis, A. ; Petford-Long, A.K. ; Bozeman, S.P. ; Bown, H. ; Clifton, P.H. ; Larson, D.J.
Author_Institution :
Dept. of Mater., Oxford Univ., UK
Abstract :
Summary form only given. Correlation of magnetoresistance to nanoscale microstructural properties is desirable for optimization of multilayer films designed for magnetic recording applications. Recently, the characterization technique of three-dimensional atom probe (3DAP) analysis has been successfully applied to such structures. Unlike techniques such as x-ray diffraction or transmission microscopy, 3DAP has the capability to deconvolute chemical mixing at multilayer interfaces from morphological roughness. In the current work, a multilayer stack consisting of Si/seed/CoFe/(Cu/CoFe)x5/cap has been studied.
Keywords :
annealing; cobalt alloys; copper; iron alloys; magnetic multilayers; magnetoresistance; CoFe-Cu; CoFe/Cu multilayer film; annealing; interfacial chemical mixing; magnetoresistance; microstructural properties; morphological roughness; three-dimensional atom probe analysis; Annealing; Atomic layer deposition; Design optimization; Magnetic analysis; Magnetic films; Magnetic multilayers; Magnetic properties; Magnetic recording; Magnetoresistance; Probes;
Conference_Titel :
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
0-7803-7365-0
DOI :
10.1109/INTMAG.2002.1001471
