Title :
Advanced Process Control: benefits for photolithography process control
Author :
Gould, Christopher
Author_Institution :
Infineon Technol. Richmond, Sandston, VA, USA
fDate :
6/24/1905 12:00:00 AM
Abstract :
High volume, cost effective, manufacturing of state of the art lithography processes requires in depth understanding of Process and Process-Tool interaction to achieve Advanced Process Control (APC). The APC systems being deployed at Infineon Technologies, Richmond has shown and is expected to continue demonstrating continuous improvement for the following primary metrics: · OL and CD Cpk · Rework Reduction · Reduction of MTTD · Lot Cycle Time improvement.
Keywords :
photolithography; process control; Advanced Process Control system; photolithography process control; semiconductor manufacturing; Automatic control; Control systems; Fault detection; Lithography; Manufacturing processes; Metrology; Predictive models; Process control; Semiconductor device manufacture; Semiconductor device modeling;
Conference_Titel :
Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
Print_ISBN :
0-7803-7158-5
DOI :
10.1109/ASMC.2002.1001582
