DocumentCode :
1579353
Title :
Measurement of mechanical properties of boron doped silicon microresonators using a resonant frequency technique
Author :
Uttamchandani, D.
Author_Institution :
Dept. of Electron. & Electr. Eng., Strathclyde Univ., Glasgow, UK
fYear :
1995
fDate :
11/30/1995 12:00:00 AM
Firstpage :
42461
Lastpage :
42463
Abstract :
A technique for non-destructively measuring the Young´s modulus and internal stress in a family of microengineered boron doped silicon resonators has been described and appropriate experiments undertaken. Results show that the value of Young´s modulus for our boron doped silicon is within a few percent of that quoted in the literature for pure silicon. We have also confirmed that a large internal stress exists in the resonator due to the inclusion of the boron atoms in the silicon lattice
Keywords :
Young´s modulus; boron; elastic moduli measurement; elemental semiconductors; internal stresses; light interferometry; micromachining; micromechanical resonators; silicon; stress measurement; Si:B; Young´s modulus; doped elemental semiconductor; heterodyne interferometry; internal stress; mechanical properties measurement; micromachined structures; microresonators; nondestructive measurement; resonant frequency technique; resonator dimensions; tensile stress;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Methods of Materials Measurement in Microengineering, IEE Colloquium on
Conference_Location :
London
Type :
conf
DOI :
10.1049/ic:19951466
Filename :
497050
Link To Document :
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