DocumentCode
1579431
Title
Characterisation of micron scale piezomagnetic materials in devices
Author
Gibbs, M.R.J.
Author_Institution
Centre for Adv. Magnetic Mater. & Devices, Sheffield Univ., UK
fYear
1995
fDate
11/30/1995 12:00:00 AM
Firstpage
42583
Lastpage
42585
Abstract
The authors have previously discussed the use of piezomagnetic materials in microelectromechanical systems. Optimum response, in terms of piezomagnetic properties, comes from control of the ferromagnetic domain structure. It is important that moment rotation dominates the magnetisation process, the magnetisation rotating coherently through 90°. It is important to assess the magnetisation distribution on length scales less than the device dimensions. The sample volumes involved preclude inductive methods, and so an optical method is to be preferred. Fine spot sizes allow a plot of magnetisation, M, against field, H, in a device almost point by point. The magneto-optic Kerr effect (MOKE) is the chosen route. We have applied the MOKE technique to some simple lithographically defined structures, and have shown the power of the technique in discriminating various magnetisation modes, and hence intrinsic domain structures. Using well focused light it is possible to interrogate magnetic films of very small lateral dimension, including films grown in the full device configuration. The effects of growth parameters, and device activation can therefore be directly assessed
Keywords
Kerr magneto-optical effect; ferromagnetic materials; lithography; magnetic anisotropy; magnetic domains; magnetic thin film devices; magnetic thin films; micromechanical devices; device activation; ferromagnetic domain structure control; growth parameters; intrinsic domain structures; lithographically defined structures; magnetic films; magnetisation distribution; magnetisation process; magneto-optic Kerr effect; magnetocrystalline anisotropy; microelectromechanical systems; micron scale piezomagnetic materials; moment rotation; optimum response; very small lateral dimension;
fLanguage
English
Publisher
iet
Conference_Titel
Methods of Materials Measurement in Microengineering, IEE Colloquium on
Conference_Location
London
Type
conf
DOI
10.1049/ic:19951470
Filename
497054
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