DocumentCode :
1579447
Title :
Dimensional metrology of NPL photomask standards
Author :
McCarthy, M.B.
Author_Institution :
Nat. Phys. Lab., Teddington, UK
fYear :
1995
fDate :
11/30/1995 12:00:00 AM
Firstpage :
42614
Lastpage :
42618
Abstract :
This paper describes measuring machines, tools and calibration techniques developed at the National Physical Laboratory (NPL) for the calibration of optical metrology standards. Such standards include one dimensional line pitch and linewidth scales, two dimensional photomasks plates (X-Y), circular optical fibres and reference stage graticules used for the calibration of image analysers. Specific details are given on the design of a fully automatic length measuring machine (400 mm machine) having an absolute accuracy of 1 part in 107 and modifications to a commercial photomask comparator are presented. Individual results from these measuring machines are plotted and their mathematical combination which has resulted in a state of the art capability for the calibration of seven inch two-dimensional photomask standards (uncertainty of 8 parts in 107) is discussed
Keywords :
calibration; length measurement; masks; measurement standards; photolithography; National Physical Laboratory standards; X-Y position standard; automatic length measuring machine; calibration techniques; circular optical fibres; commercial photomask comparator; dimensional metrology; image analysers; linewidth scales; measuring machines; one dimensional line pitch scales; optical length standards; optical metrology standards; photomask standards; reference stage graticules; two dimensional photomask plates;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Methods of Materials Measurement in Microengineering, IEE Colloquium on
Conference_Location :
London
Type :
conf
DOI :
10.1049/ic:19951471
Filename :
497055
Link To Document :
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