DocumentCode :
1579974
Title :
Beyond DFM: when manufacturability has to be guaranteed by design
Author :
Potts, David C. ; Luk, Timwah
Author_Institution :
Fairchild Semicond. Corp., South Portland, ME, USA
fYear :
2002
fDate :
6/24/1905 12:00:00 AM
Firstpage :
247
Lastpage :
251
Abstract :
Designers and test engineers are increasingly being challenged to introduce new high performance products within ever tightening tolerance windows. Traditional production test solutions may not be able to deliver the required accuracy to guarantee performance by test without additional and often prohibitive investments in extreme high-end test systems. In order to maintain a reasonable cost of manufacturing, it is not sufficient that these parts be designed for manufacturability-they must be guaranteed by design. To be considered guaranteed by design, one needs to have the utmost confidence in their design for manufacturability system and particularly in the accuracy of their simulations. This paper describes multivariate analysis techniques, leveraging electrical test data on the process level, to accurately model the statistical variation of the process as well as provide the means for evaluating where any given ET sample falls within that distribution for validating simulations against actual measured performance data. A case study drawn from a recent product introduction in a 0.35 μm CMOS technology is used for demonstration.
Keywords :
CMOS integrated circuits; design for manufacture; integrated circuit design; integrated circuit manufacture; integrated circuit modelling; integrated circuit testing; integrated circuit yield; statistical analysis; statistical process control; 0.35 micron; CMOS technology; design for manufacturability; electrical test data leveraging; factor analysis; high speed low voltage differential signaling driver; manufacturability guaranteed by design; multivariate analysis techniques; production test solutions; regression analysis; semiconductor industry; simulation accuracy; statistical modeling; statistical variation; test engineers; tolerance windows; yield prediction; CMOS technology; Costs; Design engineering; Design for manufacture; Investments; Maintenance engineering; Performance analysis; Production systems; System testing; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
Print_ISBN :
0-7803-7158-5
Type :
conf
DOI :
10.1109/ASMC.2002.1001613
Filename :
1001613
Link To Document :
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