DocumentCode
1579996
Title
A Programmable Discharge Circuitry With Current Limiting Capability for a Retinal Prosthesis
Author
Sivaprakasam, Mohanasankar ; Liu, Wentai ; Wang, Guoxing ; Weiland, James D. ; Humayun, Mark S.
Author_Institution
Dept. of Electr. Eng., California Univ., Santa Cruz, CA
fYear
2006
Firstpage
5234
Lastpage
5237
Abstract
Biphasic stimulation is the most commonly used electrical pattern in FES (Functional Electrical Stimulation). In such cases, a charge balanced waveform is essential to prevent any charge accumulation in the biological tissue. In a retinal prosthesis, a charge cancellation circuitry is used to discharge the stimulation sites on the retina periodically to ensure tissue safety. But discharging a node that has high voltage (due to charge accumulation) will induce large currents that might lead to unintended stimulation of the retina. This paper presents a new discharge circuitry which can act as a simple resistive discharge path for smaller voltages and a current limiter for higher voltages. In stimulation circuits which use a dual voltage scheme (positive and negative), the circuit limits the current at both polarities. The discharge profile is programmable digitally. In addition, a method to characterize inter-pixel leakage in a retinal prosthesis using this circuit is proposed
Keywords
bioelectric phenomena; biological tissues; biomedical electronics; eye; prosthetics; biological tissue; biphasic stimulation; charge accumulation; charge balanced waveform; charge cancellation circuitry; current limiter; current limiting capability; discharge circuitry; dual voltage scheme; electrical pattern; functional electrical stimulation; interpixel leakage; programmable discharge circuitry; resistive discharge path; retina; retinal prosthesis; tissue safety; Coils; Current limiters; Driver circuits; Electrodes; Implants; Mirrors; Prosthetics; Retina; Telemetry; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Engineering in Medicine and Biology Society, 2005. IEEE-EMBS 2005. 27th Annual International Conference of the
Conference_Location
Shanghai
Print_ISBN
0-7803-8741-4
Type
conf
DOI
10.1109/IEMBS.2005.1615659
Filename
1615659
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