Title :
Statistical modeling and analysis of wafer test fail counts
Author_Institution :
Infineon Technol., Munich, Germany
fDate :
6/24/1905 12:00:00 AM
Abstract :
This paper presents a yield analysis technique based on test fail counts, as these are the most comprehensive and fundamental yield data available. Obviously, this requires the analysis of large volumes of data. Using powerful statistical techniques, such as Principal Component Analysis (PCA) and Multiple Linear Regression (MLR), efficient data reduction is achieved. A basic concept for the modeling of both defect related and parametric fails is presented. Based on a real life examples, means, variances, and covariances of test fail counts are analyzed. As covariance turns out to play a significant role, it is further analyzed using PCA to work out major independent sources of variation. MLR is then applied to partition total yield loss, resulting in the complete representation of actual yield data by just a few relevant patterns. Identification of physical root causes is consequently greatly simplified and accelerated, leading to fast problem solving and yield improvement.
Keywords :
covariance analysis; data reduction; integrated circuit modelling; integrated circuit reliability; integrated circuit testing; integrated circuit yield; principal component analysis; covariance; data reduction; defect related fails; fast problem solving; means; multiple linear regression; parametric fails; physical root cause identification; principal component analysis; relevant patterns; semiconductor manufacturing; statistical analysis; statistical modeling; total yield loss partitioning; variances; wafer test fail counts; yield analysis technique; yield improvement; yield modeling; Circuit testing; Data mining; Fabrication; Failure analysis; Integrated circuit technology; Integrated circuit yield; Life testing; Linear regression; Principal component analysis; Semiconductor device modeling;
Conference_Titel :
Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
Print_ISBN :
0-7803-7158-5
DOI :
10.1109/ASMC.2002.1001616