Title :
Study of airborne molecular contamination in minienvironments
Author_Institution :
Asyst Technol. Inc, Fremont, CA, USA
fDate :
6/24/1905 12:00:00 AM
Abstract :
A comprehensive study of airborne molecular contamination (AMC) in minienvironments is presented in this paper. The impact of AMC on semiconductor manufacturing processes is reviewed. Models that describe contamination mechanisms are developed. The technologies and performance of minienvironments in contamination control are discussed based on theoretical models and experimental data.
Keywords :
clean rooms; filtration; integrated circuit manufacture; semiconductor process modelling; surface contamination; airborne molecular contamination; chemical filtration; cleanrooms; contamination control; contamination mechanisms; hermetic seal; minienvironments; models; semiconductor manufacturing processes; wafer processes; Chemical processes; Chemical technology; Equations; Manufacturing processes; Optical films; Optical sensors; Semiconductor device modeling; Solids; Surface contamination; Surface resistance;
Conference_Titel :
Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
Print_ISBN :
0-7803-7158-5
DOI :
10.1109/ASMC.2002.1001624
