• DocumentCode
    1580288
  • Title

    ABC modeling: advanced features [semiconductor manufacturing]

  • Author

    Miraglia, Stephanie ; Blouin, Cathy ; Boldman, Gary ; Judd, Shauna ; Richardson, Thomas ; Yao, David

  • Author_Institution
    IBM Microelectron. Div., Essex Junction, VT, USA
  • fYear
    2002
  • fDate
    6/24/1905 12:00:00 AM
  • Firstpage
    336
  • Lastpage
    339
  • Abstract
    At IBM in Essex Junction, Vermont, an enhanced ABC model is being used not only to assign costs to wafers, but in several new ways that have enabled analysis across multiple dimensions. The model is being used to aid cost reduction activities by providing wafer cost breakdown by process type (e.g., expose, deposition, etch, cleans, measurement), by element (e.g., depreciation, chemicals, staffing, occupancy), by level (e.g., poly gate, metal, via), and by equipment state (e.g., productive or idle). These new cost breakdowns allow a more complete understanding of the cost contribution of different factors and therefore enable proper focus with regard to cost reduction activities and productivity studies. For example, wafer costs broken down by masking layer show that critical levels (i.e., critical in terms of printing requirements) are the most expensive to manufacture. This approach changes classical activity-based-costing (ABC) from a financial tool to a managerial tool for assessing factory dynamics.
  • Keywords
    costing; integrated circuit economics; integrated circuit modelling; semiconductor process modelling; IBM; activity-based costing modeling; cost contribution; cost reduction activities; cost-of-ownership; critical levels; enhanced ABC model; factory dynamics; financial element; historical model; idle time; managerial tool; masking layer; process type; productivity; semiconductor manufacturing; wafer cost breakdown; Chemical elements; Chemical processes; Chemical products; Costs; Electric breakdown; Etching; Productivity; Semiconductor device manufacture; Semiconductor device modeling; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
  • Print_ISBN
    0-7803-7158-5
  • Type

    conf

  • DOI
    10.1109/ASMC.2002.1001629
  • Filename
    1001629