Title :
Chromium Nitride Coating by Inductively Coupled Plasma-assisted RF Magnetron Sputtering
Author :
Jang, Ho-Sung ; Kim, Yu-Sung ; Choi, Dae-Han ; Lee, Jae-Young ; Park, Ji-Hye ; Choi, Jong-In ; Choi, Bi-Kong ; You, Yong-Zoo ; Chun, Hui-Gon ; Kim, Dae-II
Author_Institution :
Sch. of Material Sci. & Eng., Ulsan Univ.
Abstract :
Chromium nitride (CrN) films were deposited by using inductively coupled plasma (ICP) assisted RF magnetron sputtering to investigate the effect of substrate bias voltage on the hardness, surface morphology roughness, and crystalline growth on Si(100) substrate. As increasing substrate bias voltage (Vb), surface hardness increased from 5 to 15 GPa. The grain size also increased proportionally as increasing Vb from -30 to -80, while beyond -80 Vb, the grain size was deteriorated by an intense N+ion bombardment.
Keywords :
chromium compounds; grain size; hardness; sputtered coatings; surface morphology; 5 to 15 GPa; CrN; chromium nitride coating; crystalline growth; inductively coupled plasma-assisted RF magnetron sputtering; substrate bias voltage; substrate effects; surface hardness; surface morphology roughness; Chromium; Coatings; Couplings; Grain size; Plasmas; Radio frequency; Rough surfaces; Sputtering; Surface roughness; Voltage; AFM; Nitrogen ion beam; SEM; XRD; hardness;
Conference_Titel :
Strategic Technology, The 1st International Forum on
Conference_Location :
Ulsan
Print_ISBN :
1-4244-0426-6
Electronic_ISBN :
1-4244-0427-4
DOI :
10.1109/IFOST.2006.312331
