Chromium Nitride Coating by Inductively Coupled Plasma-assisted RF Magnetron Sputtering

Author

Jang, Ho-Sung ; Kim, Yu-Sung ; Choi, Dae-Han ; Lee, Jae-Young ; Park, Ji-Hye ; Choi, Jong-In ; Choi, Bi-Kong ; You, Yong-Zoo ; Chun, Hui-Gon ; Kim, Dae-II

Author_Institution

Sch. of Material Sci. & Eng., Ulsan Univ.

fYear

2006

Firstpage

356

Lastpage

357

Abstract

Chromium nitride (CrN) films were deposited by using inductively coupled plasma (ICP) assisted RF magnetron sputtering to investigate the effect of substrate bias voltage on the hardness, surface morphology roughness, and crystalline growth on Si(100) substrate. As increasing substrate bias voltage (Vb), surface hardness increased from 5 to 15 GPa. The grain size also increased proportionally as increasing Vb from -30 to -80, while beyond -80 V_b, the grain size was deteriorated by an intense N⁺ion bombardment.

Keywords

chromium compounds; grain size; hardness; sputtered coatings; surface morphology; 5 to 15 GPa; CrN; chromium nitride coating; crystalline growth; inductively coupled plasma-assisted RF magnetron sputtering; substrate bias voltage; substrate effects; surface hardness; surface morphology roughness; Chromium; Coatings; Couplings; Grain size; Plasmas; Radio frequency; Rough surfaces; Sputtering; Surface roughness; Voltage; AFM; Nitrogen ion beam; SEM; XRD; hardness;

fLanguage

English

Publisher

ieee

Conference_Titel

Strategic Technology, The 1st International Forum on

Conference_Location

Ulsan

Print_ISBN

1-4244-0426-6

Electronic_ISBN

1-4244-0427-4

Type

conf

DOI

10.1109/IFOST.2006.312331

Filename

4107403