Absorbing layers for thermal infrared detectors

Author

Lang, W. ; Kuhl, K. ; Sandmaier, H.

Author_Institution

Fraunhoferinst. fur Festkorpertechnol., Munchen, Germany

fYear

1991

Firstpage

635

Lastpage

638

Abstract

Methods for depositing thin film infrared absorbers are investigated, including thin metallic films, platinum black deposited by a galvanic process, and highly porous metals deposited by evaporation in nitrogen. Thin metallic films with critical sheet resistance provide absorption up to 0.5. Their thickness must be controlled exactly. Platinum black reaches full absorption if the film is thicker than 1.5 mg/cm/sup 2/. The most efficient absorbers are highly porous metallic films deposited by thermal evaporation in nitrogen. Black gold provides full absorption with a film of 250 mu g/cm/sup 2/.<>

Keywords

electrodeposition; electrodeposits; electronic conduction in metallic thin films; gold; infrared detectors; light absorption; metallic thin films; nitrogen; optical films; platinum; porous materials; vapour deposited coatings; vapour deposition; Au; N/sub 2/; Pt black; critical sheet resistance; evaporation; galvanic process; porous metallic films; porous metals; thermal evaporation; thermal infrared detectors; thin film infrared absorbers; thin metallic films; Current density; Electromagnetic wave absorption; Galvanizing; Gold; Infrared detectors; Lead; Platinum; Semiconductor films; Silicon; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on

Conference_Location

San Francisco, CA, USA

Print_ISBN

0-87942-585-7

Type

conf

DOI

10.1109/SENSOR.1991.148959

Filename

148959