Title :
Absorbing layers for thermal infrared detectors
Author :
Lang, W. ; Kuhl, K. ; Sandmaier, H.
Author_Institution :
Fraunhoferinst. fur Festkorpertechnol., Munchen, Germany
Abstract :
Methods for depositing thin film infrared absorbers are investigated, including thin metallic films, platinum black deposited by a galvanic process, and highly porous metals deposited by evaporation in nitrogen. Thin metallic films with critical sheet resistance provide absorption up to 0.5. Their thickness must be controlled exactly. Platinum black reaches full absorption if the film is thicker than 1.5 mg/cm/sup 2/. The most efficient absorbers are highly porous metallic films deposited by thermal evaporation in nitrogen. Black gold provides full absorption with a film of 250 mu g/cm/sup 2/.<>
Keywords :
electrodeposition; electrodeposits; electronic conduction in metallic thin films; gold; infrared detectors; light absorption; metallic thin films; nitrogen; optical films; platinum; porous materials; vapour deposited coatings; vapour deposition; Au; N/sub 2/; Pt black; critical sheet resistance; evaporation; galvanic process; porous metallic films; porous metals; thermal evaporation; thermal infrared detectors; thin film infrared absorbers; thin metallic films; Current density; Electromagnetic wave absorption; Galvanizing; Gold; Infrared detectors; Lead; Platinum; Semiconductor films; Silicon; Wavelength measurement;
Conference_Titel :
Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-87942-585-7
DOI :
10.1109/SENSOR.1991.148959
