DocumentCode :
1583884
Title :
A solid-state imager joined to an avalanche multiplier film with micro-bump electrodes
Author :
Yamazaki, Junichi ; Maruyama, Hirotaka ; Andoh, Fumihiko ; Tanioka, Kenkichi ; Araki, Shuichi ; Tsuji, Kazutaka ; Kawamura, Tatsuro
Author_Institution :
NHK Sci. & Tech. Res. Labs., Tokyo, Japan
fYear :
1995
Firstpage :
175
Lastpage :
178
Abstract :
A highly sensitive solid-state imager has been made by connecting an avalanche multiplier film to a CMOS readout circuit via micro-bump electrodes. Optimization of the vapor-deposition conditions for the indium bump material made it possible for micro-bumps of 5 μm diameter and 4 μm height to be formed into a 2/3-inch matrix array of 380,000 pixels. A prototype imager was constructed with a 0.5-μm-thick avalanche photoconductive film. Clear avalanche multiplication of about ten times was observed at an applied voltage of 75 V. The imager had a good resolution and no recognizable after-images
Keywords :
CMOS integrated circuits; avalanche breakdown; image sensors; photoconducting devices; 380000 pixel; 75 V; CMOS readout circuit; In; avalanche multiplication; matrix array; micro-bump electrodes; optimization; photoconductive film; solid-state imager; vapor deposition; CMOS image sensors; Electrodes; Image resolution; Indium; Joining processes; Photoconducting materials; Photoconductivity; Prototypes; Solid state circuits; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1995. IEDM '95., International
Conference_Location :
Washington, DC
ISSN :
0163-1918
Print_ISBN :
0-7803-2700-4
Type :
conf
DOI :
10.1109/IEDM.1995.497208
Filename :
497208
Link To Document :
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