Title :
Development of wafer-scale sealing test using different size of micro-resonators
Author :
Okada, Hironao ; Itoh, Toshihiro ; Suga, Tadatomo
Author_Institution :
Dept. of Precision Eng., Tokyo Univ.
Abstract :
In this paper, we report a development of wafer-scale sealing test using different size micro-resonators. In order to characterize sealing quality, many research groups use vacuum sensors inside a cavity such as a comb-drive resonator or a diaphragm. Since the fabrication processes and structures are somewhat complicated, problems about the cost, yield and restriction of bonding materials can be arisen. In this study, we make the Si micro-cantilevers with different size for increase of measurable pressure range on pyrex glass wafers using 4-inch SOI wafers. In order to simplify the structures, external equipments for measuring the resonant characteristics and an external piezoelectric plate for excitation are used. As a result, the measurable pressure range is from about 0.1 to 1000 Pa. The surface of the test wafer can be Si or deposited metal films and even the non-patterned cap wafers also can be used
Keywords :
cantilevers; elemental semiconductors; mechanical testing; metallic thin films; microcavities; micromechanical resonators; piezoelectric devices; seals (stoppers); silicon; silicon-on-insulator; wafer bonding; SOI wafers; Si; bonding materials; comb-drive resonator; deposited metal films; diaphragm; fabrication processes; micro-cantilevers; micro-resonators; nonpatterned cap wafers; piezoelectric plate for; pyrex glass wafers; sealing quality; vacuum sensors; wafer-scale sealing test; Costs; Fabrication; Glass; Piezoelectric films; Pressure measurement; Resonance; Sensor phenomena and characterization; Size measurement; Testing; Wafer bonding;
Conference_Titel :
Microsystems, Packaging, Assembly Conference Taiwan, 2006. IMPACT 2006. International
Conference_Location :
Taipei
Print_ISBN :
1-4244-0735-4
Electronic_ISBN :
1-4244-0735-4
DOI :
10.1109/IMPACT.2006.312174