DocumentCode :
1585066
Title :
Design challenges for the 45 nm node and below
Author :
Schoellkopf, Jean-Pierre
Author_Institution :
STMicroelectronics
fYear :
2006
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Very Large Scale Integration, 2006 IFIP International Conference on
Conference_Location :
Nice, France
Print_ISBN :
3-901882-19-7
Type :
conf
DOI :
10.1109/VLSISOC.2006.313274
Filename :
4107592
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1585066
