DocumentCode :
1585930
Title :
The effects of cyclic thermal loading on n-type 4H-SiC device components for EM-gun pulsers
Author :
Cole, M.W. ; Hubbard, C. ; Demaree, D. ; Fountzoulas, C.G. ; Swab, J.J. ; Natarajan, A. ; Searson, P. ; Weihs, T.P. ; Miller, R.A. ; Zhu, D. ; Xie, K.
Author_Institution :
US Army Res. Lab., Aberdeen Proving Ground, MD, USA
fYear :
1998
Firstpage :
35
Lastpage :
40
Abstract :
This study developed and performed laboratory experiments which mimic the acute thermal cycling inflicted on device structures during high power switching for use in future EM-gun systems. Ni contacts to n-SiC were the device components selected for cyclic thermal testing. Modifications of the Ni-SiC materials properties in response to cyclic thermal fatigue were quantitatively assessed via Rutherford backscattering spectrometry (RBS), scanning electron microscopy (SEM), atomic force microscopy (AFM), surface profilometry, transmission electron microscopy (TEM) and nanoindentation testing. Decreases in nanohardness, elastic modulus and surface roughness were observed in response to thermal fatigue. No compositional modifications were observed at the metal-semiconductor interface. Our results demonstrated that the majority of the material changes were initiated after the first thermal pulse and that the effects of subsequent thermal cycling (up to 10 pulses) were negligible. The stability of the metal-semiconductor interface after exposure to repeated pulsed thermal cycling lends support for the utilization of Ni as a contact metallization for high power pulsed switching applications
Keywords :
Rutherford backscattering; atomic force microscopy; electromagnetic launchers; hardness testing; high-temperature electronics; indentation; ohmic contacts; power semiconductor switches; scanning electron microscopy; semiconductor device metallisation; semiconductor device reliability; semiconductor device testing; semiconductor-metal boundaries; silicon compounds; surface topography; thermal stability; thermal stress cracking; transmission electron microscopy; wide band gap semiconductors; EM-gun pulsers; Ni contacts; Ni-SiC; Rutherford backscattering spectrometry; atomic force microscopy; contact metallization; cyclic thermal fatigue; cyclic thermal loading effects; cyclic thermal testing; elastic modulus; high power pulsed switching; high power switching; metal-semiconductor interface stability; n-type 4H-SiC device components; nanohardness; nanoindentation testing; ohmic contacts; reliability; scanning electron microscopy; surface profilometry; surface roughness; thermal stability; transmission electron microscopy; Atomic force microscopy; Fatigue; Laboratories; Rough surfaces; Scanning electron microscopy; Semiconductor-metal interfaces; Surface roughness; Thermal force; Thermal loading; Transmission electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Temperature Electronics Conference, 1998. HITEC. 1998 Fourth International
Conference_Location :
Albuquerque, NM
Print_ISBN :
0-7803-4540-1
Type :
conf
DOI :
10.1109/HITEC.1998.676757
Filename :
676757
Link To Document :
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