A self-calibrating barrier-detector microsystem in standard silicon circuit technology

Author

Kuratli, C. ; Huang, Q. ; Brand, O. ; Baltes, H.

Author_Institution

Swiss Federal Inst. of Technol., Zurich, Switzerland

Volume

2

fYear

34881

Firstpage

867

Abstract

The realization of an ultrasound barrier system using micromachined silicon membranes is discussed. The transducer membranes are fabricated using a standard bipolar/CMOS process plus one additional etching step which facilitates the co-integration of sensor and read-out electronics. A transmitter and receiver incorporating a self calibrating scheme to overcome matching problems between transmitter and receiver resonance frequencies are described

Keywords

CMOS integrated circuits; acoustic transducers; bipolar integrated circuits; calibration; elemental semiconductors; etching; membranes; microsensors; receivers; silicon; transmitters; ultrasonic transducers; Si; bipolar/CMOS process; etching step; matching problems; micromachined silicon membranes; read-out electronics; receiver; resonance frequencies; self-calibrating barrier-detector microsystem; standard silicon circuit technology; transducer membranes; transmitter; Biomembranes; CMOS technology; Integrated circuit technology; Intelligent sensors; Resistors; Resonant frequency; Sensor systems; Silicon; Transmitters; Ultrasonic imaging;

fLanguage

English

Publisher

ieee

Conference_Titel

Industrial Electronics, 1995. ISIE '95., Proceedings of the IEEE International Symposium on

Conference_Location

Athens

Print_ISBN

0-7803-7369-3

Type

conf

DOI

10.1109/ISIE.1995.497300

Filename

497300