DocumentCode
1587334
Title
New result in 6H SiC “site-competition” epitaxy
Author
Zelenin, Viktor V. ; Lebedev, A.A. ; Rastegaeva, Marina G. ; Davydov, Denis V. ; Chelnokov, Valentin E.
Author_Institution
A.F. Ioffe Physicotech. Inst., Acad. of Sci., St. Petersburg, Russia
fYear
1998
Firstpage
305
Lastpage
307
Abstract
In this work we report on an investigation of 6H-SiC epitaxial layers grown by using atmospheric pressure CVD with a CH4-SiH 4-H2 gas system. The epilayers are characterised by volt-capacitance measurements and preliminary results of i-DLTS spectroscopy
Keywords
deep level transient spectroscopy; electrical conductivity; semiconductor epitaxial layers; semiconductor growth; silicon compounds; vapour phase epitaxial growth; wide band gap semiconductors; 6H-SiC epitaxial layer; SiC; atmospheric pressure CVD growth; i-DLTS spectroscopy; site-competition epitaxy; volt-capacitance measurement; Argon; Capacitance-voltage characteristics; Conductivity; Epitaxial growth; Epitaxial layers; Gases; Inductors; Semiconductor device doping; Silicon carbide; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
High Temperature Electronics Conference, 1998. HITEC. 1998 Fourth International
Conference_Location
Albuquerque, NM
Print_ISBN
0-7803-4540-1
Type
conf
DOI
10.1109/HITEC.1998.676809
Filename
676809
Link To Document