DocumentCode :
158896
Title :
Emission properties of the plasma faced materials covered with thin films
Author :
Sinelnikov, D.N. ; Kurnaev, V.A. ; Mamedov, N.V.
Author_Institution :
Moscow Eng. Phys. Inst., Nat. Res. Nucl. Univ. MEPhI, Moscow, Russia
fYear :
2014
fDate :
Sept. 28 2014-Oct. 3 2014
Firstpage :
545
Lastpage :
548
Abstract :
Electric field between the plasma and the plasma faced components can be high enough for appearance of prebreakdown currents measured in the experiments on vacuum insulation. In turn, thin insulating films on plasma faced surfaces can significantly change its emission properties and generate surface-plasma instabilities. In this paper, the results of current-voltage characteristic measurement accompanied with in situ diagnostics of the surfaces covered by non-metal films and water adsorption layers by using low angle ion spectroscopy are presented.
Keywords :
adsorption; insulating thin films; plasma instability; plasma-wall interactions; vacuum breakdown; current-voltage characteristic measurement; electric field; emission properties; low angle ion spectroscopy; nonmetal films; plasma faced surfaces; prebreakdown currents; surface diagnostics; surface-plasma instabilities; thin insulating films; vacuum insulation; water adsorption layers; Films; Ions; Plasmas; Rough surfaces; Surface roughness; Surface treatment; Tungsten;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum (ISDEIV), 2014 International Symposium on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4799-6750-6
Type :
conf
DOI :
10.1109/DEIV.2014.6961740
Filename :
6961740
Link To Document :
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