DocumentCode
158896
Title
Emission properties of the plasma faced materials covered with thin films
Author
Sinelnikov, D.N. ; Kurnaev, V.A. ; Mamedov, N.V.
Author_Institution
Moscow Eng. Phys. Inst., Nat. Res. Nucl. Univ. MEPhI, Moscow, Russia
fYear
2014
fDate
Sept. 28 2014-Oct. 3 2014
Firstpage
545
Lastpage
548
Abstract
Electric field between the plasma and the plasma faced components can be high enough for appearance of prebreakdown currents measured in the experiments on vacuum insulation. In turn, thin insulating films on plasma faced surfaces can significantly change its emission properties and generate surface-plasma instabilities. In this paper, the results of current-voltage characteristic measurement accompanied with in situ diagnostics of the surfaces covered by non-metal films and water adsorption layers by using low angle ion spectroscopy are presented.
Keywords
adsorption; insulating thin films; plasma instability; plasma-wall interactions; vacuum breakdown; current-voltage characteristic measurement; electric field; emission properties; low angle ion spectroscopy; nonmetal films; plasma faced surfaces; prebreakdown currents; surface diagnostics; surface-plasma instabilities; thin insulating films; vacuum insulation; water adsorption layers; Films; Ions; Plasmas; Rough surfaces; Surface roughness; Surface treatment; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum (ISDEIV), 2014 International Symposium on
Conference_Location
Mumbai
Print_ISBN
978-1-4799-6750-6
Type
conf
DOI
10.1109/DEIV.2014.6961740
Filename
6961740
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