• DocumentCode
    158896
  • Title

    Emission properties of the plasma faced materials covered with thin films

  • Author

    Sinelnikov, D.N. ; Kurnaev, V.A. ; Mamedov, N.V.

  • Author_Institution
    Moscow Eng. Phys. Inst., Nat. Res. Nucl. Univ. MEPhI, Moscow, Russia
  • fYear
    2014
  • fDate
    Sept. 28 2014-Oct. 3 2014
  • Firstpage
    545
  • Lastpage
    548
  • Abstract
    Electric field between the plasma and the plasma faced components can be high enough for appearance of prebreakdown currents measured in the experiments on vacuum insulation. In turn, thin insulating films on plasma faced surfaces can significantly change its emission properties and generate surface-plasma instabilities. In this paper, the results of current-voltage characteristic measurement accompanied with in situ diagnostics of the surfaces covered by non-metal films and water adsorption layers by using low angle ion spectroscopy are presented.
  • Keywords
    adsorption; insulating thin films; plasma instability; plasma-wall interactions; vacuum breakdown; current-voltage characteristic measurement; electric field; emission properties; low angle ion spectroscopy; nonmetal films; plasma faced surfaces; prebreakdown currents; surface diagnostics; surface-plasma instabilities; thin insulating films; vacuum insulation; water adsorption layers; Films; Ions; Plasmas; Rough surfaces; Surface roughness; Surface treatment; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum (ISDEIV), 2014 International Symposium on
  • Conference_Location
    Mumbai
  • Print_ISBN
    978-1-4799-6750-6
  • Type

    conf

  • DOI
    10.1109/DEIV.2014.6961740
  • Filename
    6961740