Title :
Temperature coefficient of on-state breakdown in InP- and GaAs-based heterostructure FETs
Author :
Dieci, D. ; Tomasi, T. ; Buttari, D. ; Meneghesso, G. ; Canali, C. ; Zanoni, E.
Author_Institution :
Dipt. di Sci. dell´´Ingegneria, Modena Univ., Italy
fDate :
6/21/1905 12:00:00 AM
Abstract :
The breakdown measurements of GaAs-based and InP-based III-V devices measured in pulsed and DC conditions are presented. We will show that on-state breakdown voltage in InP-based HEMTs and GaAs HFETs has an opposite behavior as a function of the temperature. When increasing the temperature the breakdown voltage decreases in InP-based HEMTs while it increases in GaAs-based devices. This is due to the different thermal coefficient of the electron multiplication factor in InP- and in GaAs-based heterostructure FETs. This makes the design of power devices lattice matched on InP a challenge since the breakdown performance degrades when increasing the operating temperature. We will also show that DC measurements are not the right technique for evaluating on-state breakdown of power MESFETs and HEMTs since device self heating can induce wrong results. We propose pulsed measurements as a viable alternative
Keywords :
field effect transistors; high electron mobility transistors; semiconductor device breakdown; semiconductor device measurement; semiconductor device reliability; DC conditions; GaAs; III-V devices; InP; breakdown performance; breakdown voltage; device self heating; electron multiplication factor; heterostructure FETs; on-state breakdown; pulsed conditions; temperature coefficient; thermal coefficient; Electric breakdown; Electrons; Gallium arsenide; HEMTs; III-V semiconductor materials; Lattices; MODFETs; Pulse measurements; Temperature; Thermal factors;
Conference_Titel :
High Performance Electron Devices for Microwave and Optoelectronic Applications, 1999. EDMO. 1999 Symposium on
Conference_Location :
London
Print_ISBN :
0-7803-5298-X
DOI :
10.1109/EDMO.1999.821466