DocumentCode :
1589954
Title :
The Ultimate Drift Velocity in Two Dimensional Quantum Limit
Author :
Ahmadi, Mohammad Taghi ; Saad, Ismail ; Ismail, Razali ; Arora, Vijay K.
Author_Institution :
Fac. of Electr. Eng., Univ. Technol. of Malaysia, Johor Bahru
fYear :
2008
Firstpage :
980
Lastpage :
984
Abstract :
In a conventional MOSFET, carriers are confined in a direction normal to the channel, and free to move in two dimensions. It is, however, now with nanotubes possible to make structures that confine carriers in two dimensions, so that they are free to move only in one direction. The nanowires and nanotubes are being considered as best candidates for high-speed applications because of the high mobility due to the suppression of the ionized impurity scattering especially at low temperatures. It is shown that the high mobility does not always lead to higher carrier velocity. Using the distribution function that takes into account the asymmetrical distribution of drifting electrons in an electric field is presented .This distribution function transforms the random motion of electrons into a streamlined one that gives the ultimate saturation velocity that is a function of temperature in nondegenerate regime and a function of carrier concentration in the degenerate regime The ultimate drift velocity is found to be appropriate thermal velocity for a given dimensionality for nondegenerately doped samples. However, the ultimate drift velocity is the appropriate average of the Fermi velocity for degenerately doped samples.
Keywords :
MOSFET; nanotubes; statistical distributions; MOSFET; asymmetrical distribution; carrier concentration; carriers; distribution function; drifting electrons; electrons random motion; ionized impurity scattering; nanotubes; two dimensional quantum limit; ultimate drift velocity; Asia; Carrier confinement; Charge carrier processes; Distribution functions; Electron mobility; MOSFET circuits; Nanotubes; Particle scattering; Silicon; Temperature; Fermi velocity; Quantum limit; Ultimate drift velocity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Modeling & Simulation, 2008. AICMS 08. Second Asia International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-0-7695-3136-6
Electronic_ISBN :
978-0-7695-3136-6
Type :
conf
DOI :
10.1109/AMS.2008.53
Filename :
4530609
Link To Document :
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