Pulsed ion-beam evaporation for material applications

Author

Jiang, W. ; Kitayama, S. ; Suzuki, T. ; Yatsui, K.

Author_Institution

Extreme Energy-Density Res. Inst., Nagaoka Univ. of Technol., Niigata, Japan

Volume

1

fYear

2001

Firstpage

376

Abstract

The intense, pulsed ion beam is used to generate high-density, high-temperature ablation plasma. This ablation plasma has potential applications in material development such as thin-film deposition and nanosize material synthesis. We studied the processes of ion-beam energy deposition and ablation plasma expansion by using the diagnostic techniques of calorimetry and high-speed photography. The results are used to understand the ablation plasma characteristics that are very important issues in material applications.

Keywords

ion beam effects; nanostructured materials; plasma production; thin films; ablation plasma characteristics; ablation plasma expansion; calorimetry; diagnostic techniques; high-density high-temperature ablation plasma; high-speed photography; intense pulsed ion beam; ion-beam energy deposition; nanosize material synthesis; thin-film deposition; Calorimetry; Ion beams; Nanostructured materials; Photography; Plasma applications; Plasma diagnostics; Plasma materials processing; Plasma properties; Pulse generation; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Pulsed Power Plasma Science, 2001. PPPS-2001. Digest of Technical Papers

Conference_Location

Las Vegas, NV, USA

Print_ISBN

0-7803-7120-8

Type

conf

DOI

10.1109/PPPS.2001.1002071

Filename

1002071