DocumentCode
1590727
Title
A selective CVD tungsten process for micromotors
Author
Liang-Yuh Chen ; MacDonald, N.C.
Author_Institution
Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
fYear
1991
Firstpage
739
Lastpage
742
Abstract
A selective chemical deposition (CVD) tungsten process is used to fabricate micromotors on a silicon substrate. The fabrication of the variable capacitance micromotors that have been produced using integrated-circuit processing is described. Both rotors and stators greater than 3 micrometers thick for these motors are formed using a high deposition rate, planar, and selective CVD tungsten process. Tungsten micromotors with rotor diameters of 100 micrometers and 60 micrometers have been fabricated with amorphous silicon rotor bearings.<>
Keywords
capacitor motors; chemical vapour deposition; metallisation; micromechanical devices; small electric machines; tungsten; Si substrate; W-Si; fabrication; high deposition rate; integrated-circuit processing; rotors; selective CVD; stators; variable capacitance micromotors; Capacitance; Chemical processes; Chemical vapor deposition; Fabrication; Micromotors; Planar motors; Rotors; Silicon; Stators; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-87942-585-7
Type
conf
DOI
10.1109/SENSOR.1991.148989
Filename
148989
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