DocumentCode :
159249
Title :
Quantum dot lasers on silicon
Author :
Liu, Alan Y. ; Chong Zhang ; Gossard, Arthur C. ; Bowers, John E.
Author_Institution :
Mater. Dept., UCSB, Santa Barbara, CA, USA
fYear :
2014
fDate :
27-29 Aug. 2014
Firstpage :
205
Lastpage :
206
Abstract :
We describe recent developments on 1.3 μm InAs/GaAs quantum dot lasers epitaxially grown on silicon by molecular beam epitaxy. Record high output powers, lasing temperatures, and operating lifetimes among GaAs based lasers epitaxially grown on silicon have been achieved.
Keywords :
III-V semiconductors; elemental semiconductors; gallium arsenide; indium compounds; molecular beam epitaxial growth; optical fabrication; quantum dot lasers; silicon; InAs-GaAs; Si; lasing temperatures; molecular beam epitaxy; operating lifetimes; output powers; quantum dot lasers; silicon; wavelength 1.3 mum; Gallium arsenide; Power generation; Quantum dot lasers; Silicon; Threshold current; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2014 IEEE 11th International Conference on
Conference_Location :
Paris
Print_ISBN :
978-1-4799-2282-6
Type :
conf
DOI :
10.1109/Group4.2014.6961926
Filename :
6961926
Link To Document :
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