Title :
Self-consistent convective fluid model for moderate pressure microwave plasma-assisted chemical vapor deposition reactors
Author :
Meierbachtol, Collin S. ; Grotjohn, Timothy A. ; Shanker, Balasubramaniam
Author_Institution :
Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
Abstract :
Microwave plasma-assisted chemical vapor deposition (PACVD) reactors are used for the production of high quality diamond films. Microwave PACVD systems have traditionally been operated at pressures between 10 and 150 Torr, resulting in diamond growth rates of up to 5 um/hr.
Keywords :
chemical reactors; diamond; microwave materials processing; plasma CVD; thin films; C; PACVD reactors; diamond growth rates; high quality diamond films; microwave PACVD systems; moderate pressure microwave plasma-assisted chemical vapor deposition reactors; pressure 10 torr to 150 torr; self-consistent convective fluid model;
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
DOI :
10.1109/PLASMA.2013.6634855
