• DocumentCode
    1593123
  • Title

    Retention modeling of nanocrystalline flash memories: A Monte Carlo approach

  • Author

    Ghosh, Bahniman ; Liu, Hai ; Winstead, Brian ; Foisy, Mark C. ; Banerjee, Sanjay K.

  • Author_Institution
    Indian Inst. of Technol., Kanpur, India
  • fYear
    2010
  • Firstpage
    203
  • Lastpage
    205
  • Abstract
    In this work we perform a study of the data retention behavior of silicon nanocrystalline flash memories. Charge loss is modeled through direct and trap assisted tunneling from the nanocrystals to the channel and to the neighboring nanocrystals. The discrete loss of charge is modeled by a Monte Carlo algorithm. In addition to being more realistic, the Monte Carlo approach, can inherently take into account statistical fluctuations among different memory devices and the effect becomes more important as the devices are scaled down in size. The simulated charge retention data has been fitted to experimental data and show reasonable agreement for various temperatures and oxide thicknesses.
  • Keywords
    Monte Carlo methods; elemental semiconductors; flash memories; semiconductor device models; silicon; tunnelling; Monte Carlo approach; Si; data retention behavior; discrete loss of charge; neighboring nanocrystals; silicon nanocrystalline flash memories; simulated charge retention data modelling; statistical fluctuations; trap assisted tunneling; Flash memory; Monte Carlo methods; Memory; Monte Carlo; Nanocrystal; Silicon; Traps;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Electronics (ICSE), 2010 IEEE International Conference on
  • Conference_Location
    Melaka
  • Print_ISBN
    978-1-4244-6608-5
  • Type

    conf

  • DOI
    10.1109/SMELEC.2010.5549551
  • Filename
    5549551