DocumentCode
1593123
Title
Retention modeling of nanocrystalline flash memories: A Monte Carlo approach
Author
Ghosh, Bahniman ; Liu, Hai ; Winstead, Brian ; Foisy, Mark C. ; Banerjee, Sanjay K.
Author_Institution
Indian Inst. of Technol., Kanpur, India
fYear
2010
Firstpage
203
Lastpage
205
Abstract
In this work we perform a study of the data retention behavior of silicon nanocrystalline flash memories. Charge loss is modeled through direct and trap assisted tunneling from the nanocrystals to the channel and to the neighboring nanocrystals. The discrete loss of charge is modeled by a Monte Carlo algorithm. In addition to being more realistic, the Monte Carlo approach, can inherently take into account statistical fluctuations among different memory devices and the effect becomes more important as the devices are scaled down in size. The simulated charge retention data has been fitted to experimental data and show reasonable agreement for various temperatures and oxide thicknesses.
Keywords
Monte Carlo methods; elemental semiconductors; flash memories; semiconductor device models; silicon; tunnelling; Monte Carlo approach; Si; data retention behavior; discrete loss of charge; neighboring nanocrystals; silicon nanocrystalline flash memories; simulated charge retention data modelling; statistical fluctuations; trap assisted tunneling; Flash memory; Monte Carlo methods; Memory; Monte Carlo; Nanocrystal; Silicon; Traps;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Electronics (ICSE), 2010 IEEE International Conference on
Conference_Location
Melaka
Print_ISBN
978-1-4244-6608-5
Type
conf
DOI
10.1109/SMELEC.2010.5549551
Filename
5549551
Link To Document