DocumentCode
159385
Title
High Q photonic crystal cavities realised using Deep Ultraviolet Lithography
Author
Welna, K. ; Debnath, Kapil ; Dumon, P. ; Khanna, Ashish ; Krauss, Thomas F. ; O´Faolain, L.
Author_Institution
Sch. of Phys. & Astron., Scottish Univ. Phys. Alliance (SUPA), St. Andrews, UK
fYear
2014
fDate
27-29 Aug. 2014
Firstpage
161
Lastpage
162
Abstract
Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.
Keywords
Q-factor; optical design techniques; optical fabrication; optical resonators; optimisation; photonic crystals; ultraviolet lithography; deep ultraviolet lithography; high Q factor optical resonators; high Q photonic crystal cavities; optimized design; silicon devices; Lithography; Optical device fabrication; Optical resonators; Photonic crystals; Physics; Q-factor;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2014 IEEE 11th International Conference on
Conference_Location
Paris
Print_ISBN
978-1-4799-2282-6
Type
conf
DOI
10.1109/Group4.2014.6961997
Filename
6961997
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