Title :
High Q photonic crystal cavities realised using Deep Ultraviolet Lithography
Author :
Welna, K. ; Debnath, Kapil ; Dumon, P. ; Khanna, Ashish ; Krauss, Thomas F. ; O´Faolain, L.
Author_Institution :
Sch. of Phys. & Astron., Scottish Univ. Phys. Alliance (SUPA), St. Andrews, UK
Abstract :
Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.
Keywords :
Q-factor; optical design techniques; optical fabrication; optical resonators; optimisation; photonic crystals; ultraviolet lithography; deep ultraviolet lithography; high Q factor optical resonators; high Q photonic crystal cavities; optimized design; silicon devices; Lithography; Optical device fabrication; Optical resonators; Photonic crystals; Physics; Q-factor;
Conference_Titel :
Group IV Photonics (GFP), 2014 IEEE 11th International Conference on
Conference_Location :
Paris
Print_ISBN :
978-1-4799-2282-6
DOI :
10.1109/Group4.2014.6961997
