High-efficiency subwavelength-engineered surface grating couplers in SOI and DSOI

Author

Benedikovic, Daniel ; Cheben, Pavel ; Schmid, Jens H. ; Xu, Dan-Xia ; Wang, Shuhui ; Janz, Siegfried ; Halir, Robert ; Ortega-Monux, A. ; Dado, Milan

Author_Institution

Dept. of Telecommun. & Multimedia, Univ. of Zilina, Žilina, Slovakia

fYear

2014

fDate

27-29 Aug. 2014

Firstpage

41

Lastpage

42

Abstract

The coupling efficiency of a surface grating coupler is optimized for a an arbitrary buried oxide thickness by adjusting the grating radiation angle. The coupler is apodized using a subwavelength structure, allowing a single etch step fabrication. The measured coupling loss is -2.16dB with 3dB bandwidth of 64nm, for a minimum feature size of 100nm. It is also shown by simulations that by implementing this coupler in a double SOI (DSOI) wafer, an ultra-low coupling loss of -0.42dB is achieved.

Keywords

diffraction gratings; etching; integrated optoelectronics; optical couplers; optical fabrication; optical losses; silicon-on-insulator; DSOI; Si; arbitrary buried oxide thickness; coupling efficiency; coupling loss; double SOI wafer; grating radiation angle; high-efficiency subwavelength-engineered surface grating couplers; single etch step fabrication; subwavelength structure; Couplers; Couplings; Fiber gratings; Gratings; Optical surface waves; Optical waveguides; Silicon; fiber-to-chip grating coupler; integrated optics; silicon-on-insulator (SOI); subwavelength grating (SWG);

fLanguage

English

Publisher

ieee

Conference_Titel

Group IV Photonics (GFP), 2014 IEEE 11th International Conference on

Conference_Location

Paris

Print_ISBN

978-1-4799-2282-6

Type

conf

DOI

10.1109/Group4.2014.6962018

Filename

6962018