Title :
Temperature-insensitive silicon ring fabricated by DUV lithography and overlaid with highly negative thermo-optic TiO2
Author_Institution :
ETRI, Daejeon, South Korea
Abstract :
Temperature-dependent spectral variations of 5 μm-radius silicon ring resonators, which are fabricated by deep ultra-violet (DUV) lithography and overlaid by air, silica and highly negative thermo-optic TiO2, respectively, are compared by experiment.
Keywords :
elemental semiconductors; integrated optics; optical fabrication; optical resonators; silicon; silicon compounds; thermo-optical devices; thermo-optical effects; titanium compounds; ultraviolet lithography; DUV lithography; Si-SiO2-TiO2; deep ultraviolet lithography; negative thermo-optic cladding; radius 5 mum; temperature-dependent spectral variations; temperature-insensitive silicon ring resonators; Lithography; Optical ring resonators; Optimized production technology; Polymers; Silicon; Temperature measurement; Ultraviolet sources;
Conference_Titel :
Group IV Photonics (GFP), 2014 IEEE 11th International Conference on
Conference_Location :
Paris
Print_ISBN :
978-1-4799-2282-6
DOI :
10.1109/Group4.2014.6962023
