Title :
Accurate MOS modelling for analog circuit simulation using the EKV model
Author :
Bucher, Matthias ; Lallement, Christophe ; Enz, Christian ; Krummenacher, François
Author_Institution :
Electron. Lab., Swiss Federal Inst. of Technol., Lausanne, Switzerland
Abstract :
Effective, manufacture-oriented design and simulation of high-performance analog and mixed-mode integrated circuits and systems is known to critically depend on the quality of extracted device parameters as well as the simulation model being used. This has gained increased relevance for low-voltage low-current designs, either in bulk CMOS or emerging SOI technologies. The EKV model is introduced within a complete, statistically efficient and simple characterisation methodology. Valuable insight into the behavior of transistors in strong, moderate and weak inversion is gained, which also allows for increased design creativity. Measured results from a submicron bulk CMOS and a fully depleted SOI process illustrate the accuracy of the EKV model and the associated parameter extraction under several geometries and regions of device operation
Keywords :
CMOS analogue integrated circuits; MOS analogue integrated circuits; circuit analysis computing; integrated circuit modelling; silicon-on-insulator; EKV model; MOS modelling; Si; analog circuit simulation; characterisation methodology; fully depleted SOI process; manufacture-oriented simulation; parameter extraction; submicron bulk CMOS; Analog circuits; Analog integrated circuits; CMOS process; CMOS technology; Circuit simulation; Integrated circuit manufacture; Integrated circuit modeling; Integrated circuit technology; Semiconductor device modeling; Virtual manufacturing;
Conference_Titel :
Circuits and Systems, 1996. ISCAS '96., Connecting the World., 1996 IEEE International Symposium on
Conference_Location :
Atlanta, GA
Print_ISBN :
0-7803-3073-0
DOI :
10.1109/ISCAS.1996.542121