Author :
Lau, Y.Y. ; Chernin, D.P. ; Zhang, Peng ; Gilgenbach, Ronald M.
Author_Institution :
Univ. of Michigan, Ann Arbor, MI, USA
Abstract :
Contact problems account for 40 percent of all electrical/electronic failures. Severe heating due to local current constrictions at thin film contacts [1-3] and at bulk contacts [2,4] is also a concern to high power microwave sources, pulsed power systems, field emitters, thin film devices and integrated circuits, and interconnects, etc. In this paper, we investigate one aspect of electro-thermal instabilities, namely, the increase in electrical conductivity as the temperature increases, as typical of semiconductors. This may lead to thermal runaway, at a fixed voltage. We deduce from the heat conduction equation a voltage scale, Vs [in volts], which characterizes thermal runaway. It is given by, Vs = sqrt(P/s), where P is the thermal conductivity [in W/m-K] and s is the rate of change of the electrical conductivity with respect to temperature [in 1/(ohm-m-K)]. Note that Vs depends only on material properties and is independent of geometry or the operating voltage. It measures the intrinsic tolerance of the material to electro-thermal instability. For various materials (Si, Ge, SiC) at room temperature, the typical values of P = (142, 58, 370) respectively, and s = (1.17, 0.104, 0.0003), yielding the values of Vs = (11, 24, 1100). Thus, SiC is the most resistant to thermal runaway for the same geometry and the same operating voltage, consistent with the well-known property of this material.
Keywords :
electrical conductivity; electrical contacts; germanium; silicon compounds; thermal conductivity; thin film devices; thin films; Ge; Si; SiC; bulk contacts; electrical conductivity; electrical/electronic failures; electro-thermal instabilities; electro-thermal instability; electro-thermal runaway; field emitters; heat conduction equation; high power microwave sources; integrated circuits; pulsed power systems; semiconductors; temperature 293 K to 298 K; thermal conductivity; thin film contacts; thin film devices; Conductivity; Contacts; Educational institutions; Materials; Plasma temperature; Temperature measurement; Thermal conductivity;