DocumentCode :
1595984
Title :
A Novel microwave plasma source based on rectangular resonator
Author :
Zhong Wang ; Guixin Zhang ; Zhidong Jia
Author_Institution :
Dept. of Electr. Eng., Tsinghua Univ., Beijing, China
fYear :
2013
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. This paper introduces a novel microwave plasma source, which is comprised of a WR430 waveguide, an inductive waveguide coupling window, a rectangular microwave resonator, a closed rectangular quartz cavity and a sliding short-circuit plunger. And this quartz cavity can be removed to generate open microwave plasma. The WR430 waveguide connects the coupling window and the standard microwave device (three-screw tuner). The microwave energy is coupled into the resonator and quartz cavity through the coupling window. The short-circuit plunger is freely adjusted in the range from zero to 90 mm. The structure of this microwave plasma source is optimized by using CST and the optimal result indicates: the width, height and thickness of the coupling window are separately 35.5 mm, 54.6 mm and 2 mm; the width and height of the resonator is 113.2 mm and 77 mm, respectively; the outer dimensions and wall thickness of the quartz cavity are separately 240 mm, 112 mm, 76 mm and 8 mm. The microwave energy stores in the form of standing wave in the resonator and several large strong-electric-field regions periodically distributes inside it. The maximum electric intensity of the standing wave within the quartz cavity is about 3400 V / m for per watt of microwave power at best resonator length (named the resonator resonant length) for the microwave frequency f = 2.45 GHz. After removing the quartz cavity, an open microwave plasma is produced in the resonator. The air plasma stays a little far from the coupling window and its root is located at the middle of the resonator wide face. After introducing the quartz cavity, an atmospheric air microwave plasma is generated in the cavity by the procedure: firstly producing a low-pressure air plasma and then making the plasma open to the atmosphere. These two kinds of atmospheric air plasmas are both comparatively stable and their volumes both approach to 100 cm3. With the quartz cavity or not, the microwave - eflectance of the microwave plasma source increases with the increase of the microwave power when the atmospheric air plasma is produced. For lower powers, the reflectance with the plasma is even smaller than that without the plasma. The smaller microwave reflectance indicates that the impedance of the microwave plasma source is more approaching to the equivalent impedance of the microwave generation and transmission system. It can be found that the rotational temperatures of previous two-case atmospheric air plasmas both roughly have nothing to do with the microwave power by comparing normalized NOγ (A-X) and OH (A-X) rotational lines1 at different microwave powers.
Keywords :
cavity resonators; crystal resonators; plasma dielectric properties; plasma filled waveguides; plasma sources; plasma temperature; plasma-wall interactions; quartz; CST; OH (A-X) rotational line; WR430 waveguide; atmospheric air microwave plasma; closed rectangular quartz cavity; coupling window height; coupling window width; equivalent impedance; frequency 2.45 GHz; inductive waveguide coupling window; large strong-electric-field region; low-pressure air plasma; maximum electric intensity; microwave energy; microwave frequency; microwave generation; microwave plasma source impedance; microwave power; microwave reflectance; normalized NOγ (A-X) rotational line; open microwave plasma; pressure 1 atm; rectangular microwave resonator; resonator resonant length; rotational temperatures; size 112 mm; size 113.2 mm; size 240 mm; size 35.5 mm; size 54.6 mm; size 76 mm; size 77 mm; size 8 mm; sliding short-circuit plunger; standard microwave device; standing wave; three-screw tuner; transmission system; wall thickness; Cavity resonators; Couplings; Microwave devices; Optical resonators; Plasma sources; Reflectivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
ISSN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2013.6634973
Filename :
6634973
Link To Document :
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