Title :
Propagation-decay characteristics of locally ionized microplasma packets in arrays of microchannels
Author :
Jin Hoon Cho ; Min Hwan Kim ; Hee Jun Yang ; Sung-Jin Park ; Eden, J. Gary
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
Abstract :
Summary form only given. Plasma propagation and its decay properties in an array of microscale channels has been investigated at atmospheric pressure in He and Ar. Microplasmas in channels having a width of 200-300 μm, a length to width aspect ratio of up to ~ 103: 1, and a volume of 1-50 mm3 have been generated by micromachining and wet chemical processes, these channels are situated in a dielectric barrier structure fabricated in 125-250 μm thick Al foil. Spatiotemporally-resolved optical emission profiles, recorded with a gated CCD camera and a telescope, reveal a plasma optical interaction with neighboring channels and propagation speed (and direction of excited emission along the microchannel) which varies with gas mixture. In Ar 760 Torr, propelled by the accumulation of charge on the microchannel wall, packets of low temperature, nonequilibrium plasma propagate at a uniform velocity of ~20 km-s-1. The dominant mechanism for volumetric electron loss to be dissociative recombination.
Keywords :
aluminium; argon; dissociation; gas mixtures; helium; ion recombination; micromachining; plasma chemistry; plasma diagnostics; Al; Al foil; Ar; He; atmospheric pressure; decay properties; dielectric barrier structure; dissociative recombination; excited emission; gas mixture; gated CCD camera; locally ionized microplasma packets; microchannel arrays; microchannel wall; micromachining; microscale channels; plasma optical interaction; plasma propagation; pressure 1 atm; pressure 760 torr; propagation speed; propagation-decay characteristics; size 125 mum to 250 mum; size 200 mum to 300 mum; spatiotemporally-resolved optical emission profiles; volumetric electron loss; wet chemical processes; width aspect ratio; Dielectrics; Microchannel; Optical arrays; Optical device fabrication; Optical propagation; Plasmas; Stimulated emission;
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
DOI :
10.1109/PLASMA.2013.6634982