• DocumentCode
    1596366
  • Title

    Microcavity plasma devices operating in air: Optimization of the device structure for efficient nitric oxide generation

  • Author

    Shin, Changhwan ; Park, Sung-Jin ; Eden, J. Gary

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
  • fYear
    2013
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. This presentation describes the fabrication and operation of microdischarge devices which can sustain stable air plasma inside the microcavity and efficiently produce desired gas species from a gas flow. A DC-discharge type microcavity device has been fabricated on nanoporous Al2O3 dielectrics, a robust dielectric produced by wet chemical processing.Production of nitric oxide (NO) from air discharge is one of key interests in this presentation with a potential application of biomedical therapeutics. By controlling the microdischarge device characteristics designed to have optimized condition for NO generation, it can produce NO species selectively at voltages, at least a order lower compared to other conventional techniques. Quantitative measurement of gas species out of the air microplasmas will be discussed.
  • Keywords
    discharges (electric); microcavities; nitrogen compounds; optimisation; plasma devices; plasma sources; Al-Al2O3; DC-discharge type microcavity device; NO; air discharge; air microplasmas; biomedical therapeutics application; device structure optimization; efficient nitric oxide generation; gas flow; gas quantitative measurement; microcavity plasma devices; microdischarge device characteristics; microdischarge device fabrication; microdischarge device operation; nanoporous alumina dielectrics; nitric oxide production; optimized condition; size 100 mum to 200 mum; stable air plasma; wet chemical processing; Aluminum oxide; Computers; Dielectrics; Discharges (electric); Microcavities; Optimization; Plasma devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2013.6634989
  • Filename
    6634989