Title : 
Evaluation of a solid state 120 kV microsecond pulse charger for a 1–10 nanosecond pulse generator
         
        
            Author : 
Huiskamp, T. ; Beckers, F.J.C.M. ; van Heesch, E.J.M. ; Pemen, A.J.M.
         
        
            Author_Institution : 
Eindhoven Univ. of Technol., Eindhoven, Netherlands
         
        
        
        
        
            Abstract : 
Summary form only given. In this paper we present a solid state 120 kV microsecond pulse charger for our nanosecond pulse generator [1]. The pulse forming line of our nanosecond pulse generator must be charged with microsecond pulses to prevent pre-firing of its oil spark-gap. The pulse charger consists of three identical very compact pulse transformer units with integrated electronics. The electronics are mounted on a compact PCB and consist mainly of a number of parallel connected IGBT´s that switch a primary capacitor bank into the pulse transformer. Each pulse charger unit can generate 50 kV microsecond pulses into a 350 pF load at 1 kHz repetition rate. Connected together they are able to deliver more than 120 kV into a 100 pF load. This 100 pF load is the pulse forming line of our nanosecond pulse generator at its maximum length of 1 m. The pulse charger is able to operate in an EMI unfriendly environment due to its compact lay-out and optical triggering of the IGBT´s.
         
        
            Keywords : 
insulated gate bipolar transistors; pulse generators; capacitance 100 pF; capacitance 350 pF; compact PCB; frequency 1 kHz; integrated electronics; nanosecond pulse generator; oil spark gap; parallel connected IGBT; pulse forming line; pulse transformer; solid state microsecond pulse charger; voltage 120 kV; voltage 50 kV; Educational institutions; Insulated gate bipolar transistors; Optical switches; Pulse generation; Pulse transformers; Solids;
         
        
        
        
            Conference_Titel : 
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
         
        
            Conference_Location : 
San Francisco, CA
         
        
        
        
            DOI : 
10.1109/PLASMA.2013.6635000